High-Density Targets for Stable PVD Processes

Eliminating Arcing and Spitting in Thin Film Deposition

In magnetron sputtering and Physical Vapor Deposition (PVD), the microstructural integrity of the target material is the deciding factor for film yield. When using a standard LaB6 sputtering target, internal gas pockets or uneven grain distribution can lead to catastrophic plasma arcing and particle spitting, resulting in defective coatings. Telite Ceramics addresses these challenges by providing a fully densified Lanthanum Hexaboride target engineered for high-vacuum stability.

1. Vacuum Hot-Pressing for Near-Theoretical Density

The core advantage of our material lies in our advanced densification mechanism. Unlike traditional sintering, Telite utilizes vacuum hot-pressing technology to fuse high-purity polycrystalline powders. This ensures that every hot-pressed LaB6 component achieves maximum density with zero internal porosity. This density is critical for maintaining a stable magnetron sputtering source, preventing target surface degradation and ensuring a consistent deposition rate over the target’s entire lifecycle.

2. Geometric Precision and Edge Stress Relief

Because LaB6 is a ceramic material with high hardness and inherent brittleness, poor machining can lead to micro-fractures. Telite Ceramics applies strict dimensional controls, including micrometer-level flatness and parallelism, ensuring a perfect thermal contact for unbonded/monolithic targets. Each PVD coating target undergoes precision chamfering (stress relief) on all edges. This crucial step prevents edge chipping during high-power plasma bombardment and simplifies the installation process into your cathode assembly.

3. Broad Application in Electronics and Optics

Our targets are widely deployed in the manufacturing of optical coatings, specialized electron emission layers, and advanced thin-film research. By choosing a high-purity source from Telite, engineers benefit from a material that has been optimized for low work function stability and exceptional thermal shock resistance.

Customization & RFQ Guide

Telite Ceramics supports rapid prototyping for both circular discs and rectangular planar targets. Please Contact Telite Ceramics and provide the following for an accurate quote:

  • Target dimensions (Diameter/Length/Width and Thickness)
  • Required tolerances and edge specifications (e.g., chamfering, locating steps)
  • Sputtering platform compatibility (e.g., RF/DC power requirements, cooling method)

Technical Director: Engineer Zhang (张工)
Tel / WhatsApp / WeChat: +86-18602175437
Email: telice@teliceramic.com
Xiamen Telite New Material Technology Co., Ltd.