Cerium Hexaboride (CeB6) Sputtering Target & Blank

CeB6 Sputtering Target for Vacuum Deposition

In magnetron sputtering and Physical Vapor Deposition (PVD), target density and material condition can directly affect coating stability and film quality. When a standard CeB6 sputtering target contains internal porosity or impurities, it may contribute to plasma instability, particle shedding, or thermal-stress-related cracking during use. Telite Ceramics supplies a dense Cerium Hexaboride target for vacuum coating and related deposition applications.

1. Hot-Pressed Density and Polycrystalline Structure

Conventional sintering routes may not always achieve the same density level for Cerium Hexaboride. Telite Ceramics provides a hot-pressed CeB6 blank with a dense polycrystalline structure for target fabrication and related vacuum coating use. During target selection, density level, grain condition, and internal structure are commonly considered to help improve material consistency during deposition.

2. Edge Condition and Mounting Stress Control

Because Cerium Hexaboride is a hard and brittle material, improper machining may lead to edge damage or local micro-cracks. This can affect handling, bonding, or mounting reliability during installation. Our processing focuses on flatness, chamfering, and dimensional control so that each PVD coating target can better match backing plates and installation structures used in different coating platforms.

3. Custom Supply for Sputtering Applications

Different PVD platforms, such as circular magnetron cathodes or rectangular planar sources, require different target dimensions and mounting details. Whether you need a finished target or a custom CeB6 target blank for your own secondary machining, we support flexible supply according to laboratory and production requirements.